Patent · US Expired

Positive-working photosensitive mixture and photolithographic copying material produced therefrom with o-quinone dialide sulfonyl ester and azo coupler

US4929534A · kind A · utility

5Cited by
23References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 26, 1988
Grant dateMay 29, 1990
Priority date
Expiry dateAug 26, 2008

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/0226
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A positive-working photosensitive mixture containing an o-quinone diazide and a binder is disclosed wherein the mixture contains a compound which is able to form an azo coupling with the o-quinone diazide. A copying material produced with the photosensitive mixture has a high photosensitivity and an exceptional developer resistance. The photosensitive mixture is used in reproduction technique, and also in the field of resists.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.