Water based photopolymerizable resin composition
US4933260A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 31, 1989 |
| Grant date | Jun 12, 1990 |
| Priority date | — |
| Expiry date | Aug 31, 2009 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/11
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A water-based photopolymerizable resin composition is disclosed which is suitable for the preparation of a relief printing plate by the photolithographic techniques. The inventive composition, which basically comprises a water-soluble polymer, e.g., poly(vinyl alcohol), a photopolymerizable monomer and a photopolymerization initiator, is characterized in that at least a part of the photopolymerizable monomer is N-tetrahydrofurfuryloxymethyl acrylamide or N-tetrahydrofurfuryloxymethyl methacrylamide. By virtue of this unique ingredient in the composition, the printing plate prepared from the inventive composition is imparted with improved fidelity of pattern reproduction and durability in printing as a consequence of increased hardness and pliability to be freed from the drawback of crack formation in printing even on a cylinder of small diameter under a cold and low-humidity condition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.