Water-developable photosensitive resin composition and resin or printing plate therefrom
US4935333A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 15, 1988 |
| Grant date | Jun 19, 1990 |
| Priority date | — |
| Expiry date | Jan 15, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/11
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a water-developable photosensitive resin composition capable of hot melt molding, which comprises: PA0 (i) a water soluble or water dispersible polyvinyl alcohol prepared by saponifying a copolymer which is obtained from copolymerizing 0 to 20 mol % of a monomer not having an ionic group (hereinafter referred to as "nonionic monomer"), 0 to 10 mol % of an ionic group-containing monomer (hereinafter referred to as "ionic monomer") and the remaining amount of a vinyl ester in the presence of a thiolic acid wherein the total content of the ionic monomer and nonionic monomer is 0.1 to 20 mol %; said polyvinyl alcohol having a terminal mercapto group, a saponification degree of the vinyl ester unit of 50 to 70 mol %, and a hot melt flow starting temperature of 60.degree. to 130.degree. C. PA0 (ii) a polymerizable monomer, and PA0 (iii) a photopolymerization initiator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.