Vapor-phase reaction apparatus
US4936251A · kind A · utility
2Cited by
7References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 22, 1985 |
| Grant date | Jun 26, 1990 |
| Priority date | — |
| Expiry date | Apr 22, 2005 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/54
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A vapor phase reaction apparatus includes a reaction chamber defined by first and second walls fixed opposite each other. Third and fourth walls are introduced into the reaction chamber already having affixed to them a substrate for deposition. A reactive gas is introduced into the reaction chamber for chemical vapor deposition onto the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.