Film-forming emulsion polish compositions containing copolymeric siloxanes

US4936914A · kind A · utility

Assignee

• S. C. Johnson & Con, Inc. · US

Inventors

• Steve M. Hurley · Racine, US
• Eric Miller · Provo, US
• Husam A. A. Rasoul · Caledonia, US

Key dates

• Filing date: Dec 20, 1988
• Grant date: Jun 26, 1990
• Expiry date: Dec 20, 2008

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C09G1/16
• WIPO field: Basic materials chemistry
• WIPO sector: Chemistry

Abstract

Disclosed are emulsion polish compositions comprising a copolymeric siloxane selected from the group consisting of a poly(dimethyl)-co-poly(methylalkyl) siloxane polymer, a poly(dimethyl)-co-poly(methyl, oxygen-containing) siloxane polymer, and combinations thereof. The poly(dimethyl)-co-poly(methylalkyl) siloxane copolymer has the formula ##STR1## wherein "A" is an alkyl radical having 10-20 carbon atoms, and wherein "w" is 70-91 mole percent and "x" is 9-30 mole percent. The poly(dimethyl)-co-poly(methyl, oxygen-containing) siloxane copolymer has the formula ##STR2## wherein "B" is (CH.sub.2).sub.i (L)(CH.sub.2 CH.sub.2 O).sub.n R, wherein "i" is an integer from 3 to 10 inclusive, wherein "L" is either --O-- or --COO--, wherein "n" is either zero or an integer from 1 to 3 inclusive, wherein "R" is --H, --CH.sub.3, or --C.sub.2 H.sub.5, and wherein "y" is 62-92 mole percent and "z" is 8-38 mole percent.