Patent · US Expired

Apparatus for producing a plasma and for the treatment of substrates

US4939424A · kind A · utility

13Cited by

5References

35Claims

0Family size

Assignee

Leybold GmBH · DE

Inventors

Jorg Kieser · Albstadt, DE
Michael Geisler · Apolda, DE
Rolf Wilhelm · Kornwestheim, DE
Eberhard Rauchle · Waiblingen, DE

Key dates

Filing date	May 23, 1989
Grant date	Jul 3, 1990
Priority date	—
Expiry date	May 23, 2009

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/32678
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The plasma produced by means of microwaves in the presence of a magnetic field and a gas serves to coat a substrate which is situated in a chamber having metal walls. The microwaves are repeatedly reflected at the metal walls, so that the chamber has numerous microwave modes. By means of permanent magnets, which are placed either inside the chamber or outside the chamber in the vicinity of the substrate that is to be coated, it is possible to produce within this chamber an electron-cyclotron resonance which permits a locally controlled ignition of the plasma.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.