Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon

US4940649A · kind A · utility

Assignee

• BASF SE

Inventors

• Reinhard Aldag · Ludwigshafen, DE
• Peter Neumann · Wiesloch, DE
• Andreas Boettcher · Leimen, DE
• Thomas Bluemel · Erpolzheim, DE
• Friedrich Seitz · Friedelsheim, DE
• Friedrich-Wilhelm Raulfs · Ludwigshafen, DE

Key dates

• Filing date: May 17, 1988
• Grant date: Jul 10, 1990
• Expiry date: May 17, 2008

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/127
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Novel photopolymerizable recording materials suitable in particular for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable, olefinically unsaturated organic compounds, optionally a polymeric binder, a photopolymerization initiator, a color-forming system composed of a color former and a photooxidant, a certain 4-phenylpyridine as sensitizer and optionally further additive and/or auxiliary substances.