Method for patterning cationic curable photoresist
US4940651A · kind A · utility
44Cited by
13References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 30, 1988 |
| Grant date | Jul 10, 1990 |
| Priority date | — |
| Expiry date | Dec 30, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/146
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Cationic curable photoresists are patterned by exposing such to a laser beam in a pattern, followed by developing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.