Semiconductor wafer carrier guide tracks
US4941429A · kind A · utility
8Cited by
12References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 20, 1988 |
| Grant date | Jul 17, 1990 |
| Priority date | — |
| Expiry date | Dec 20, 2008 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/54
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A track system is used in a continuous chemical deposition reaction system to guide semiconductor wafer carriers through a plurality of interconnected reaction chambers to position the carriers in each reaction chamber, and to prevent wear to the bottom of the reactor chambers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.