Method and apparatus for cleansing gases
US4941896A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 31, 1989 |
| Grant date | Jul 17, 1990 |
| Priority date | — |
| Expiry date | Mar 31, 2009 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E30/30
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A gas cleansing arrangement comprising a vessel (1) partially filled with liquid (32) and a gas distribution means (14) beneath the liquid surface (34). The gas distribution means (14) comprises obliquely and downwardly extending distribution pipes (26) with upwardly facing inlet openings (64) for contaminated gas and a lower opening (22). The inlet openings are each connected to a venturi device (28) having an outlet opening (31) and suction openings (29) facing the liquid (32). In use, pressurized gas urges an inner liquid surface (46) downwards in the distributor means (14), until the liquid surface (46) reaches and exposes the uppermost inlet opening or openings (64). The gas is then forced through respective venturi device (28) at a pressure drop corresponding to the height difference (h) between the inner liquid surface (46) and respective outlet opening (31). Full working pressure is always obtained and the number of operating venturi devices is automatically adapted to the incoming gas flow by rising and lowering the inner liquid surface (46).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.