Making an amorphous layer
US4942057A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 14, 1987 |
| Grant date | Jul 17, 1990 |
| Priority date | — |
| Expiry date | Aug 14, 2007 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0262
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Amorphous layers are made by decomposing one or several gaseous compounds which include an element or elements to be deposited. These are group 3 and 5 or group 4 elements but amorphous layers of other metals can also be made. The compound is added in a small concentration to a hot gas, preferably hydrogen, helium or argon and a diffusor accelerates the mixture while molecular clusters of the element or elements are formed and impinge upon a target for depositing thereon.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.