High resolution conductor patterning
US4942110A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 29, 1988 |
| Grant date | Jul 17, 1990 |
| Priority date | — |
| Expiry date | Aug 29, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/107
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A technique for generating high resolution resistor or conductor patterns on uneven surfaces by focusing a CO.sub.2 laser beam to locally render insoluable suitable thick film resistor or conductor material that has been uniformly coated onto a substrate and oven-dried to remove organic coating solvents. Patterns are generated by scanning the laser beam across the coated substrate, and the coating is hardened and adheres to the substrate where it has been exposed by the laser beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.