Process for obtaining a pattern, in ferromagnetic material having differently sloping sides
US4944831A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Aug 5, 1988 |
| Grant date | Jul 31, 1990 |
| Priority date | — |
| Expiry date | Aug 5, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49046
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Process for obtaining a pattern, particularly of ferromagnetic material, having differently sloping sides and magnetic head having such a pattern. This process consists of depositing on a ferromagnetic layer (4) resting on a ceramic support (2), a photosensitive resin layer (6), forming by photolithography an opening (8) in said resin layer and then polymerizing said resin in order that the sides (8a) of the opening are inclined, forming a two-layer mask (10a, 12a) on the resin layer partly masking said opening and defining the shape of the pattern to be produced in the ferromagnetic layer, anisotropically etching the resin layer in order to eliminate the unmasked regions of said layer, eliminating the mask, anisotropically eteching the ferromagnetic layer (4) using the etched resin layer as the etching mask (6a) and eliminating the remainder of the resin layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.