Method for applying diffusion aluminide coating
US4944858A · kind A · utility
14Cited by
10References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 8, 1988 |
| Grant date | Jul 31, 1990 |
| Priority date | — |
| Expiry date | Dec 8, 2008 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C10/14
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Sputtering techniques are utilized to form an aluminum rich diffusion coating on the surface of a superalloy substrate. The coating contains additions of oxygen active elements, such as yttrium, and the coating has an outward diffusion aluminide microstructure obtained by carrying the sputtering process out at temperatures in the range of about 1,010.degree.-1,150.degree. C.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.