Dual look ahead mask generator
US4945509A · kind A · utility
5Cited by
8References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 14, 1988 |
| Grant date | Jul 31, 1990 |
| Priority date | — |
| Expiry date | Mar 14, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F9/30038
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A mask generator for generating a mask having logical signals of a given level between positions indicated by beginning and ending addresses. Two decoders select respective binary signal lines indicating the starting and ending positions. The mask generator is composed of two mask generators operating on the higher and lower order binary signal lines respectively and which ripple from the ends of the mask towards the middle. Preferably, each of the dual mask generators has look-ahead carry capability.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.