Positive type 1,2 quinone diazide containing photosensitive resinous composition with acrylic copolymer resin
US4946757A · kind A · utility
5Cited by
6References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 27, 1988 |
| Grant date | Aug 7, 1990 |
| Priority date | — |
| Expiry date | Oct 27, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0233
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention provides a photosensitive resin composition specifically useful for microfabrication resist films and photosensitive materials for use in lithographic plates because of excellent flexibility and adhesion, and moreover, when developed, non-exposed parts being of extremely less swelling nature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.