Arrangement for producing a gas flow which is enriched with the vapor of a low-volatile substance

US4947790A · kind A · utility

Assignee

• U.S. Philips Corporation · US

Inventors

• Georg Gartner · Aachen, DE
• Peter A. Janiel · Würselen, DE
• Hans Rau

Key dates

• Filing date: Jan 10, 1989
• Grant date: Aug 14, 1990
• Expiry date: Jan 10, 2009

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/4481
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

An arrangement for producing a gas flow which is enriched with the vapor of a low-volatile material. The arrangement comprises a vessel (1) having an interior space (12) for holding a powder bed (13), which consists of a low-volatile material and an additional solid inert component. The vessel is arranged in a thermostatically controlled bath (2). A gas flow (4, 16) consisting of an inert gas flows through the arrangement, preferably in the direction of the gravitational force. The gas flow passes, in this sequence, through a thick gas inlet plate (10), the powder bed (13) and a thin gas outlet plate (14). By proper dimensioning the component parts of the arrangement and providing a low pressure in the arrangement a high mass flow of the low-volatile material with a flow constant of a long duration is achieved. The enriched gas flow is conducted, for example, to a low-pressure CVD reactor.