Process for purifying nitrogen trifluoride gas
US4948571A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 7, 1989 |
| Grant date | Aug 14, 1990 |
| Priority date | — |
| Expiry date | Apr 7, 2009 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01B21/0832
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A process of the present invention can effectively decompose, particularly, dinitrogen difluoride present in a nitrogen trifluoride gas to remove it from the gas. This process for purifying the nitrogen trifluoride gas is characterized by comprising the step of heating the nitrogen trifluoride gas containing at least dinitrogen difluoride as an impurity at a temperature of 150.degree. C. to 600.degree. C. in a metallic vessel the inner wall of which is lined with a solid fluoride, or in a packing layer of the solid fluoride in the vessel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.