Patent · US Expired

Process for purifying nitrogen trifluoride gas

US4948571A · kind A · utility

10Cited by
3References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 7, 1989
Grant dateAug 14, 1990
Priority date
Expiry dateApr 7, 2009

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01B21/0832
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A process of the present invention can effectively decompose, particularly, dinitrogen difluoride present in a nitrogen trifluoride gas to remove it from the gas. This process for purifying the nitrogen trifluoride gas is characterized by comprising the step of heating the nitrogen trifluoride gas containing at least dinitrogen difluoride as an impurity at a temperature of 150.degree. C. to 600.degree. C. in a metallic vessel the inner wall of which is lined with a solid fluoride, or in a packing layer of the solid fluoride in the vessel.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.