Tantala-silica interference filters and lamps using same
US4949005A · kind A · utility
28Cited by
8References
38Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 14, 1988 |
| Grant date | Aug 14, 1990 |
| Priority date | — |
| Expiry date | Nov 14, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01K1/32
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Thin film interference filters consisting of alternating layers of tantala and silica suitable for high temperature use on electric lamps have been made by heat treating at 550.degree.-675.degree. C. before using the filters at high temperature. Tungsten halogen lamps made with such heat treated filters have been thermally cycled for thousands of cycles at 900.degree. C. with no film loss and with satisfactory optical performance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.