Processing apparatus and method
US4949671A · kind A · utility
321Cited by
10References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 21, 1985 |
| Grant date | Aug 21, 1990 |
| Priority date | — |
| Expiry date | Dec 21, 2005 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3244
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A processing apparatus and method wherein two separate gas feeds are provided in proximity to the face of a face down wafer. A shroud can be used to maximize mixing of the two gas feed streams without excessive residence time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.