Method of gas reaction process control
US4950376A · kind A · utility
20Cited by
2References
9Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Feb 28, 1989 |
| Grant date | Aug 21, 1990 |
| Priority date | — |
| Expiry date | Feb 28, 2009 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/004
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of gas reaction process control in which plasma gas generated in a location different than a location at which a specimen is held is transported to a location at which the specimen is held and gas processing of the specimen is carried out. A control electrode with porous structure permeable to the plasma gas is provided in the transportation route and a voltage is applied to the control electrode voltage for adjusting the specimen surface potential so as to prevent degradation of the specimen due to specimen surface potential.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.