Method for fabricating superconducting oxide thin films by activated reactive evaporation
US4950642A · kind A · utility
19Cited by
5References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 5, 1988 |
| Grant date | Aug 21, 1990 |
| Priority date | — |
| Expiry date | Aug 5, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S505/786
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for fabricating a superconducting oxide thin film is disclosed which comprises the steps of separately evaporating metal elements, of which the superconducting oxide thin film with a desired stoichiometry is to be composed, to a substrate and simultaneously irradiating the substrate with oxygen plasma generated by RF wave or ECR microwave to form a crystalline oxide film without further annealing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.