Method of producing a deposition film of composite material
US4952295A · kind A · utility
17Cited by
6References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 14, 1989 |
| Grant date | Aug 28, 1990 |
| Priority date | — |
| Expiry date | Apr 14, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B11/10582
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In a method of producing a deposition film of a composite material, a plurality of sputtering targets each containing one of a plurality of different components are disposed separately in a vacuum chamber. A substrate is subjected to sputtering from the sputtering targets while being moved at an adequately high speed relative to a deposition rate from each sputtering target so that extremely thin layers of the respective components are sequentially stacked repeatedly a plurality of times to thereby form a deposition film of a composite material in which the plurality of different components are mixed uniformly.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.