Photographic light-sensitive material and method of developing the same
US4952490A · kind A · utility
10Cited by
6References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 1, 1988 |
| Grant date | Aug 28, 1990 |
| Priority date | — |
| Expiry date | Mar 1, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C2001/03517
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photographic light-sensitive material comprises a support having thereon at least one silver halide emulsion layer. At least 70% of a total number of silver halide grains contained in the emulsion layer are regular crystal grains not having a twinning plane. At least 50 mol% of the regular grains are silver chloride. The regular crystal grains have a (111) crystal plane on 30% or more of a total grain surface and are chemically sensitized in the presence of a gold compound or sulfur and gold compounds.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.