Apparatus for synthetic diamond deposition including curved filaments and substrate cooling means
US4953499A · kind A · utility
25Cited by
3References
6Claims
0Family size
Assignee
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Key dates
| Filing date | Aug 3, 1989 |
| Grant date | Sep 4, 1990 |
| Priority date | — |
| Expiry date | Aug 3, 2009 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T117/10
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Diamond is deposited by chemical vapor deposition on two parallel substrates, by means of a plurality of filaments between the substrates. The substrates and filaments are in vertical configuration and the filaments are prestressed to curve in a single plane parallel to the substrates, to allow for thermal expansion and expansion caused by filament carburization. The apparatus includes at least one and preferably two heat sinks to maintain substrate temperatures in the range of 900.degree.-1000.degree. C., for optimum rate of diamond deposition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.