Chemical deposition of copper from alkaline aqueous baths

US4954369A · kind A · utility

Assignee

• BASF SE

Inventors

• Alfred Oftring · Bad Dürkheim, DE
• Chung-Ji Tschang · Bad Dürkheim, DE
• Ekhard Winkler · Mutterstadt, DE
• Guenther Gotsmann · Bischofswerda, DE
• Klaus Glaser · Mutterstadt, DE

Key dates

• Filing date: Feb 21, 1989
• Grant date: Sep 4, 1990
• Expiry date: Feb 21, 2009

Classification

• Technology area (CPC H): Electricity
• CPC primary: H05K3/181
• WIPO field: Audio-visual technology
• WIPO sector: Electrical engineering

Abstract

Copper is chemically deposited from alkaline aqueous baths containing polyacetal complexing agents obtainable by reacting PA1 (a) dialdehydes of the formula ##STR1## and n is 0 or 1, with (b) polyolcarboxylic acids which contain 2 or more OH groups and have from 4 to 7 carbon atoms in a molar ratio of (a):(b) of from 1:0.5 to 1:3.