Patent · US Expired

Photosensitive material processing apparatus

US4954838A · kind A · utility

8Cited by
4References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 24, 1989
Grant dateSep 4, 1990
Priority date
Expiry dateMar 24, 2009

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03D3/132
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A photosensitive material processing apparatus adaptable for occasional operation is provided, comprising a processing tank filled with processing solution and an adjustable closure for controlling access to the tank through its top opening. The adjustable closure includes a fixed lid, a movable lid, and a drive for the movable lid. The operating openness, which is the surface area of the solution open to the ambient atmosphere divided by the volume of the solution, is set in a specific range and the quiescent openness is up to 70% of the operating openness.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.