Patent · US Expired

Image recording apparatus forming photomasking pattern on photosensitive medium

US4956649A · kind A · utility

4Cited by
4References
5Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 11, 1988
Grant dateSep 11, 1990
Priority date
Expiry dateJan 11, 2008

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24868
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

An image recording apparatus including a pattern forming device for forming a light-shielding pattern on one of opposite surfaces of a photosensitive recording medium. The light-shielding pattern is formed of a light-shielding material which is capable of shielding a radiation. The apparatus further includes an exposing device for irradiating the above-indicated one surface of the recording medium, and thereby forming an optical latent image which corresponds to the light-shielding pattern. The light-shielding pattern is removed by a cleaner from the recording medium after the optical latent image is formed. The optical latent image formed on the medium is developed into a visible image.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.