Pattern generation system
US4956650A · kind A · utility
18Cited by
4References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 26, 1988 |
| Grant date | Sep 11, 1990 |
| Priority date | — |
| Expiry date | Aug 26, 2008 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23K26/067
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
An improved pattern generation system. The pattern generation system of the present invention discloses an improved optical system for correcting problems of astigmatism and ellipticity in a radiant energy beam used for generating patterns on a workpiece. The present invention further discloses improved control circuitry for controlling modulation of said beams. The control circuitry corrects for problems of isofocal bias caused by non-linearities in the turn-on/turn-off of the beams.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.