Resistance heater for diamond production by CVD
US4958592A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 22, 1988 |
| Grant date | Sep 25, 1990 |
| Priority date | — |
| Expiry date | Aug 22, 2008 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/04
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A plural substrate CVD apparatus for diamond crystal production utilizes spaced apart vertical, parallel, planar substrate panels with an electrical (direct current, D.C.) resistance filament heater therebetween. A hydrogen-hydrocarbon gas mixture flows between panels to come into contact with the heater and the panels to cause diamond crystal nucleation and growth on the substrate panels. The apparatus includes means for maintaining the spaced relationship of the heater from the substrate surfaces, comprising a rod member attached to one end of the heater and tensioned by a cable passing over a pulley member and attached to a weight.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.