Deep UV photoresist with alkyl 2-diazo-1-ones as solubility modification agents
US4959293A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 28, 1988 |
| Grant date | Sep 25, 1990 |
| Priority date | — |
| Expiry date | Oct 28, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0163
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
2-diazo-1-ones are useful deep UV photoresist solubility modification agents exhibiting improved photosensitivity allowing shorter deep UV exposure times to achieve the same extent of photoreaction as with prior art solubility modification agents. The 2-diazo-1-one solubility modification agents when used as photoactive solubility modification components in photoresist compositions permit the photoresist compositions to act as either positive or negative photoresist compositions depending upon the developer employed, namely, as a positive resist when a metal ion containing developer is employed and as a negative resist when a metal ion free developer is employed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.