Patent · US Expired

Method for determining aperture shape

US4959541A · kind A · utility

14Cited by
5References
10Claims
0Family size

Assignee

Inventor

Key dates

Filing dateAug 3, 1989
Grant dateSep 25, 1990
Priority date
Expiry dateAug 3, 2009

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH04N2201/02493
  • WIPO fieldAudio-visual technology
  • WIPO sectorElectrical engineering

Abstract

A mathematical method for selecting the shape for an occluding aperture which is to be positioned at a predetermined aperture location in a light path extending between an illuminated line object and a linear photosensor array. Through use of the aperture selected according to the method, a light intensity measurement is obtained across the linear photosensor array which is uniformly proportional to the light intensity across the illuminated line object.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.