Microwave plasma treatment apparatus
US4960073A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 14, 1989 |
| Grant date | Oct 2, 1990 |
| Priority date | — |
| Expiry date | Sep 14, 2009 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32357
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A microwave plasma treatment apparatus comprises a plurality of auxiliary magnets arranged around the periphery of a plasma formation chamber. A plurality of auxiliary magnets are disposed along the circumference of the plasma formation chamber while a plurality of auxiliary magnets may also be arranged in the axial direction of the plasma formation chamber. Also, the magnetic poles of every auxiliary magnet are respectively reverse in polarity to the adjoining magnetic poles of an auxiliary magnet(s) disposed adjacent thereto either along the circumference of the plasma formation chamber or in the axial direction thereof. This enables the whole high-density plasma to be substantially uniform throughout the inside of the plasma formation chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.