Magnetron deposition of ceramic oxide-superconductor thin films
US4960753A · kind A · utility
Inventors
Key dates
| Filing date | Jun 26, 1989 |
| Grant date | Oct 2, 1990 |
| Priority date | — |
| Expiry date | Jun 26, 2009 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S505/786
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Apparatus for depositing and tailoring anisotropic properties of ceramic oxide-superconductor films onto the outer surface of fibers, wires, rods, and bars and onto the inner surface of tubes, as well as onto the surface of disc-shaped substrates, employs first and second vacuum chambers, a cylindrical magnetron structure positioned within the first vacuum chamber, a disc-shaped cold cathode positioned within the first vacuum chamber for providing a beam of energetic electrons for injection into a plasma region of the cylindrical magnetron structure, and a ring-shaped cold cathode positioned within the second vacuum chamber for providing a disc-shaped beam of electrons impinging upon the deposited film for annealing it. The magnetron cathodes comprise either single metal elements or mixtures thereof. A planar magnetron and a line-shaped cold cathode that produces an electron beam impinging on the surface of a planar substrate to provide a uniform strip heat zone are employed for depositing superconducting thin films of metal oxide ceramic materials onto the surface of wide area planar substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.