High pressure gas supply system
US4961325A · kind A · utility
24Cited by
16References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 7, 1989 |
| Grant date | Oct 9, 1990 |
| Priority date | — |
| Expiry date | Sep 7, 2009 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E60/32
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
Method and apparatus for supplying gas, especially a cryogenic gas, to a use point at high pressure, especially supercritical pressure, with little or no lag time comprising a gas supply for quickly pressurizing a vaporizable liquid and the vaporization of the pressurized liquid for high pressure gas supply.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.