Process for surface and fluid cleaning
US4962776A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 3, 1988 |
| Grant date | Oct 16, 1990 |
| Priority date | — |
| Expiry date | May 3, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67057
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A cleaning system of the apparatus utilizing the effect of surface tension forces (4) and phase changes between a liquid and gas. In one embodiment the surface (21) to be cleaned is submerged within a vessel (30), the pressure within the vessel being increased. A rapid depressurization of the vessel causes a plurality of bubbles (12) to form around undesired particulate matter (13) on the surface (14) of the article to be cleaned, the bubbles rising to the surface of the liquid (27) within the chamber, thereby cleaning the article. A second embodiment utilizes a cleaning fluid (52) which is applied to the surface of the article (49) to be cleaned. The fluid being subsequently frozen on the surface, thereby reducing the adhesion force between the surface of the article and undesired particulate matter. The surface of the article (49) is subsequently heated, and the undesired particulate matter is removed through the medium of the cleaning fluid (52).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.