Radiation-sensitive resin composition with admixtures of O-quinone diazide and acid esters having nitrobenzyl or cyanobenzyl group
US4963463A · kind A · utility
29Cited by
13References
12Claims
0Family size
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Key dates
| Filing date | Feb 15, 1989 |
| Grant date | Oct 16, 1990 |
| Priority date | — |
| Expiry date | Feb 15, 2009 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F8/34
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A radiation-sensitive resin composition comprising a quinonediazide-type radiation-sensitive resin and a compound generating an acid upon irradiation. Said radiation-sensitive resin composition can be used as a resist suitable for dry development by plasma etching and enables one to obtain an etching image having high precision with high reproducibility at a high degree of resolution and selectivity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.