Laser microbeam machine for acting on thin film objects, in particular for chemically etching or depositing substance in the presence of a reactive gas
US4964940A · kind A · utility
22Cited by
5References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 24, 1989 |
| Grant date | Oct 23, 1990 |
| Priority date | — |
| Expiry date | Nov 24, 2009 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
The machine of the invention comprises a sealed enclosure (10) in which a microscope objective lens (34) is fixed and receives a laser beam (36) via a thick transparent window (38), the enclosure also containing a reaction chamber (20) constituted by a sealed box having a lid which constitutes a thin transparent window (56) beneath which the thin film object (32) to be treated is placed. Means (72, 80, 74) serve to evacuate the enclosure (10) and the reaction chamber (20) and to convey reactive gas into the reaction chamber. The invention is particularly applicable to treating electronic circuits, hybrid circuits, etc.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.