Method of fabricating thin layers from high-temperature oxide superconductors

US4965248A · kind A · utility

Assignee

• Kernforschungsanlage Lulich Gesellschaft mit beschrankter Haftung · DE

Inventors

• Ulrich Poppe · Cologne, DE
• Jurgen Schubert · Dirmstein, DE
• Wilhelm Evers · Jülich, DE

Key dates

• Filing date: Feb 13, 1989
• Grant date: Oct 23, 1990
• Expiry date: Feb 13, 2009

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S505/731
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A method and apparatus for producing thin superconductor film of high temperature oxide type ceramic superconductors by cathodic sputtering and in which the highest possible oxygen partial pressure is utilized in the space between the cathode and the substrate. Ionizing radiation can be introduced into the space as well.