Plasma generator
US4965491A · kind A · utility
0Cited by
12References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 25, 1987 |
| Grant date | Oct 23, 1990 |
| Priority date | — |
| Expiry date | Mar 25, 2007 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/03
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma generator according to the invention comprises a chamber (2) at a first potential (V1) filled with a gas at a low pressure and a transparent electrode surface comprised of wires, grid or perforated plate (3) at a second potential (V2) higher than (V1). Thus, an electron (4) present in the chamber will be oscillating on both sides of the transparent electrode surface (3) for providing secondary electrons (11 and 12) which create in turn other secondary electrons (13-14, 15-16). At each occurence of an electron pair, one ion (i1, i2, i3, . . . ) is created.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.