High resolution deposition and etching in polymer films
US4968390A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 3, 1988 |
| Grant date | Nov 6, 1990 |
| Priority date | — |
| Expiry date | Nov 3, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/888
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Embodiments of the present invention provide a new method for producing microfine conducting features by utilizing a scanning electrochemical microscope (SECM) (a modified version of the scanning tunneling microscope) to electrochemically deposit various conducting substances on the surfaces of conductive objects. The method comprises the steps of coating or forming a polymeric or ionically conducting film layer over a conductive object upon which the conducting features are to be deposited, placing the tip of an SECM in contact with the conducting film, applying a voltage between the SECM tip and the object so that a current passes through the film from the SECM tip to the object to induce an electrochemical reaction that will cause the desired product to be deposited, and moving the tip across the surface of the film to leave a pattern of microfine deposit features. At the same time, the counter-reaction at the conductive object yields to a localized etching of the lattice with a high resolution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.