Silicon nitride vacuum furnace process
US4970057A · kind A · utility
94Cited by
0References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 14, 1990 |
| Grant date | Nov 13, 1990 |
| Priority date | — |
| Expiry date | Feb 14, 2010 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01B21/0682
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
An improved process of preparing silicon nitride by the direct nitridation of silicon metal is disclosed. The process is a multi-step one which is substantially more efficient than prior processes and produces a silicon nitride having an oxygen content of less than 1%, a silicon metal content of less than 0.5%, and an alpha phase content of at least 85%, preferably at least 90%. The silicon nitride may be converted to a powder.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.