Apparatus for synthetic diamond deposition including spring-tensioned filaments
US4970986A · kind A · utility
26Cited by
2References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 25, 1990 |
| Grant date | Nov 20, 1990 |
| Priority date | — |
| Expiry date | Jan 25, 2010 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/271
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Diamond is deposited by chemical vapor deposition on two parallel substrates, by means of a plurality of filaments between said substrates. The substrates and filaments are in vertical configuration and the filaments are linear and spring-tensioned to compensate for thermal expansion and expansion caused by filament carburization. The apparatus includes at least one and preferably two temperature controlling means, usually heat sinks, to maintain substrate temperature in the range of 900.degree.-1000.degree. C., for optimum rate of diamond deposition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.