Method for forming thin film pattern and method for fabricating thin film magnetic head using the same
US4971896A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 7, 1988 |
| Grant date | Nov 20, 1990 |
| Priority date | — |
| Expiry date | Dec 7, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/165
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method of forming a thin film pattern on a base having a step portion. This method comprises a first step of forming a thin film of given material on the base, a second step of forming a predetermined pattern of a first photoresist film on said thin film at one of a first portion including a lower part of the step portion and a second portion including an upper part of the step portion, a third step of forming a predetermined pattern of a second photoresist film on said thin film at the other of the first and second portions and a fourth step of applying ion-milling to said thin film of given material using masks said first and second photoresist film patterns formed on said thin film at the first and second portions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.