Sintered high density silicon oxnitride and method for making the same

US4975394A · kind A · utility

Assignees

• NGK SPARK PLUG CO., LTD. · US
• Kozo Izuka Director-General of Agency of Industrial Science & Technology · JP

Inventors

• Shuzo Kanzaki · Kasugai, JP
• Masayoshi Ohashi · Saitama, JP
• Hideyo Tabata · Ebeye, US
• Osami Abe · Ebeye, US
• Tooru Shimamori · Ebeye, US
• Koichi Moori · Ebeye, US

Key dates

• Filing date: Apr 28, 1988
• Grant date: Dec 4, 1990
• Expiry date: Apr 28, 2008

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C04B35/597
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

A sintered silicon oxynitride composition comprises as an amount of starting material the combination of (a) a silicon component comprising silicon nitride(Si.sub.3 N.sub.4) and silicon oxide(SiO.sub.2) in a mol ratio of SiO.sub.2 /Si.sub.3 N.sub.4 being 0.7 to 1.2, and (b) at least one second component selected from an aluminum oxide, an aluminum nitride, a rare earth oxide, and a rare earth nitride, said second component being in an amount of from about 0.1 to 10 mol per 100 mol of said silicon component.