Draft chamber
US4976815A · kind A · utility
17Cited by
12References
7Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Oct 25, 1989 |
| Grant date | Dec 11, 1990 |
| Priority date | — |
| Expiry date | Oct 25, 2009 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67023
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A draft chamber is located within a clean room for sequentially immersing and processing carriers such as silicone wafers in a plurality of solution vessels provided in the draft chamber. In the draft chamber, a first air flow moves in a substantially horizontal direction from the front portion of the draft chamber toward the rear portion above the surfaces of solutions contained in chemical solution vessels which generate toxic gasses and a second air flow moves downward from the ceiling of the draft chamber. Thus, the toxic gasses generated from the chemical solution vessels are prevented from leaking into the clean room.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.