Method of applying optical coatings of silicon compounds by cathode sputtering, and a sputtering cathode for the practice of the method
US4978437A · kind A · utility
69Cited by
6References
2Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 27, 1987 |
| Grant date | Dec 18, 1990 |
| Priority date | — |
| Expiry date | Jan 27, 2007 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/3407
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Method of applying optical coatings of silicon compounds to substrates by reactive cathode sputtering of siliceous target materials. To solve the problem of improving the utilization of the target material and eliminating the blowout of particles from the target, the target of the invention is a polycrystalline silicon casting of at least 99% silicon containing dopants from the group, boron, antimony, phosphorus and arseic, and it is sputtered by direct current in an atomsphere containing the reaction gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.