Photolabile blocked surfactants
US4980096A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 15, 1988 |
| Grant date | Dec 25, 1990 |
| Priority date | — |
| Expiry date | Jan 15, 2008 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08K5/10
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Surfactants which are blocked against surfactant action (identified herein as "photolabile blocked surfactants") by a photolabile protective or masking group but which, on exposure to actinic radiation, become unblocked are provided. Coating compositions in which surfactant is formed on irradiation are provided by blending the photolabile blocked surfactant with polymeric film-forming materials. Compositions containing the photolabile blocked surfactants are useful when employed as protective coatings on various substrates or as the adhesive in a pressure sensitive adhesive tape. Although initially well adhering to a substrate, such compositions may be readily removed from the substrate following exposure of the same to suitable radiation which unblocks the surfactant to permit it to regain its surfactant activity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.