Process for increasing the percentage of silicon tetrachloride
US4980143A · kind A · utility
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1References
2Claims
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Key dates
| Filing date | Jun 9, 1989 |
| Grant date | Dec 25, 1990 |
| Priority date | — |
| Expiry date | Jun 9, 2009 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01B33/10752
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A process is described for increasing the percentage of silicon tetrachloride during the reaction of hydrogen chloride or a mixture of hydrogen chloride and chlorine with substances containing metallic silicon. In this process the chlorosilanes are exposed to a temperature ranging between 300.degree. C. and 1400.degree. C.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.