Process for producing a protective film on magnesium containing substrates by chemical vapor deposition of two or more layers
US4980203A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 3, 1989 |
| Grant date | Dec 25, 1990 |
| Priority date | — |
| Expiry date | Jul 3, 2009 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C28/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for producing a protective film on a magnesium based metallic substrate comprising producing successive deposits by vapor phase chemical deposition of at least one intermediate layer of metallic aluminum, and at least one surface layer of metallic oxide, and for the intermediate aluminum layer using a precursor chosen of triisobutylaluminum, heating the substrate to a temperature between 250.degree. C. and 320.degree. C., and for the surface layer selecting an appropriate precursor, heating the substrate to an appropriate temperature and introducing the precursor vapor to produce a protective film having a high surface hardness and strong adherence to the magnesium based substrate with high inertness in the electrochemical series, and forming an effective protection under both static and dynamic conditions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.